Measurement of small birefringence in sapphire and quartz plates

摘要

Birefringence in quartz and sapphire plates was measured at 632.8 nm. The observed birefringence is presumed to be caused by a tilt in the optic axis with respect to the plate geometry. Two instrumental methods were used to make the measurements. A Mueller matrix laser polarimeter was used at the Air Force Research Laboratory, and the Exicor system was used at Hinds. The measurement techniques are described and results are presented.