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Structural Characterization of Sputtered Composite Stabilized ZrO_2 Thin Films

机译:溅射复合稳定ZrO_2薄膜的结构表征

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摘要

Zirconia (ZrO_2) exhibits three different polymorphic phases as a function of the thermal and pressure conditions (cubic, tetragonal and monoclinic). The use of zirconia coatings at high temperatures requires it to be stabilized at room temperature in order to maintain the high temperature phases when subjected to thermal cycles. For this purpose, this work reports different ways to stabilize ZrO_2 coatings produced by DC reactive magnetron sputtering. We have produced stabilized ZrO_2 coatings by doping with other metallic and rare earth oxides (Y_2O_3 and Gd_2O_3), depositing nanostructured ZrO_2 crystallites in an amorphous Al_2O_3 matrix and using a ZrO_2/Al_2O_3 nanolaminated structure. A comparative study of the coatings produced is presented along with their structural stabilization using different approaches. For the doped coatings the tetragonal or cubic phases were obtained as a function of the dopant percentage and for the nanostructured and nanolayered structures the stabilization mechanism is related to the constraining of the zirconia nanocrystallites and the capacity to maintain its size under certain value.
机译:氧化锆(ZrO_2)表现出三种不同的多态性相,作为热和压力条件(立方,四方和单斜)的函数。在高温下使用氧化锆涂层需要它在室温下稳定,以便在经受热循环时保持高温阶段。为此目的,这项工作报告了稳定DC反应磁控溅射产生的ZrO_2涂层的不同方式。我们通过掺杂与其他金属和稀土氧化物(Y_2O_3和GD_2O_3)掺杂,在无定形Al_2O_3基质中沉积纳米结构ZrO_2微晶并使用ZrO_2 / Al_2O_3纳米胺胺沉积的结构来生产稳定化的ZrO_2涂层。产生的涂层的比较研究随着使用不同方法的结构稳定而提出。对于掺杂涂层,以掺杂剂百分比的函数获得四边形或立方相,并且对于纳米结构和纳米制剂结构的稳定机理与氧化锆纳米晶体的约束有关,并且在某些值下保持其尺寸的能力。

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