The pattern approval process: The past, present and future as seen by US instrument manufacturers

摘要

What will the pattern approval process look like next year or in the year 2020? Will it be different than it is today? No one person or individual organization can answer both these questions with guaranteed accuracy, but each of us will agree that it will be different than it is today. Leaders of the international metrology community who were present as a group at the 2020 Seminar should be able to, can, and indeed must define the future of the pattern evaluation process and what it should look like. To do this we need to begin now. We need to look at all the hard work that was put into developing the current systems, and also at the efforts that many of the OIML Technical Committees and Subcommittees are making in focusing their work in this direction.