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High-efficiency, 10 GHz bandwidth resonant-cavity-enhanced silicon photodetectors operating at 850 nm wavelength

机译:高效率,10 GHz带宽谐振腔增强型硅光电探测器,在850nm波长下工作

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Resonant-cavity-enhanced (RCE) photodetectors have been the focus of extensive research over the past decade in the design of high bandwidth-efficiency product devices [1,2]. Silicon-based photodetectors for applications in optical communications in the near-IR wavelength range between 800-900 nm suffer from low bandwidth-efficiency products due to the long absorption length necessitated by the small absorption coefficient. Increasing the bandwidth-efficiency product is the inherent benefit of a RCE structure, which relies on the constructive interference of a Fabry-Perot cavity to enhance the optical field inside the photodetector at specific wavelengths. For semiconductor photodetectors, such a resonant cavity can be formed using a buried reflector consisting of alternating layers of semiconductors and the air/semiconductor top interface. Due to the availability of heterostructures, compound semiconductors have been the focus of RCE photodetector development [1]. Formation of buried mirrors and resonant cavities have remained as a challenge in Si technology.
机译:谐振腔增强(RCE)光电探测器是过去十年在高带宽效率产品装置设计中的广泛研究的重点[1,2]。基于硅基光电探测器,用于近红外波长范围内的光通信的应用由于小吸收系数的较小吸收长度,在800-900nm之间的近800-900nm的波长范围内遭受低带宽效率产品。增加带宽效率的产品是RCE结构的固有益处,其依赖于法布里 - 珀罗腔的建设性干涉,以在特定波长下增强光电探测器内的光学场。对于半导体光电探测器,这种谐振腔可以使用由半导体和空气/半导体顶部接口的交替层组成的掩埋反射器形成。由于异质结构的可用性,化合物半导体是RCE光电探测器显影的焦点[1]。埋藏镜和共振腔的形成仍然是SI技术的挑战。

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