0.5SrTiO/sub 3/-0.5PbTiO/sub 3/ thin films by rf-sputtering on Pt/TiN/sub x/, RuO/TiN/sub x/ and TiN/sub x/ electrodes

摘要

A novel ferroelectric thin film system denoted by xSrTiO/sub 3/-(1-x)PbTiO/sub 3/ (SPT) is studied. In this work we report results on the composition 0.5SrTiO/sub 3/-0.5PbTiO/sub 3/ (SPT5) only. For this investigation, SPT5 thin films were deposited at different temperatures (500, 550, 600 and 650/spl deg/C) by argon/oxygen ion rf sputtering on Pt/TiN/sub x//SiO/sub 2//Si, RuO/sub x//TiN/sub x//SiO/sub 2//Si and TiN/sub x//SiO/sub 2//Si substrates at different relative concentrations of argon and oxygen (Ar/O = 100/0, 50/50, 0/100). The polycrystalline xSrTiO/sub 3/-(1-x)PbTiO/sub 3/ perovskite phase formation is confirmed by x-ray diffraction (XRD) analysis and the growth dynamics is studied by scanning electron microscopy (SEM). The nature of the SPT5 layer-electrode interface is also analyzed by this technique. The microstructural features of the SPT5 thin films on Pt/TiN/sub x//SiO/sub 2//Si, RuO/sub x//TiN/sub x//SiO/sub 2//Si and TiN/sub x//SiO/sub 2//Si substrates obtained by SEM were correlated to the deposit conditions.