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Observation of polarization reversal processes in Pb(Zr,Ti)O/sub 3/ thin films using atomic force microscopy

机译:使用原子力显微镜观察PB(Zr,Ti)O / Sub 3 /薄膜的极化反转过程

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The piezoresponse-imaging technique using atomic force microscopy (AFM) provides a substantial understanding of the polarization reversal process of ferroelectric thin films at the nanoscale level. In this study, in order to investigate the polarization reversal process and its dynamics in Pb(Zr,Ti)O/sub 3/ (PZT) thin films, we examined the dependence of the switched area on the width of the switching pulse. The area of the switched domain increased from 2 /spl times/ 10/sup -3/ to 3 /spl times/ 10/sup -1/ /spl mu/m/sup 2/ as the pulse width increased from 500 ns to 100 ms. The switched area rapidly increased in the initial polarization process as the applied pulse width increased. However, the switched area stopped expanding at the grain boundaries and domain growth over grain boundaries was not observed.
机译:使用原子力显微镜(AFM)的压电响应 - 成像技术提供了对纳米级水平的铁电薄膜的极化反转过程的显着理解。在本研究中,为了研究Pb(Zr,Ti)O / Sub 3 /(PZT)薄膜中的偏振反转过程及其动力学,我们检查了开关区域对切换脉冲宽度的依赖性。切换结构域的面积从2 / SPL时间/ 10 / SUP -3 /〜3 / SPL时间/ 10 / SUP -1 / SPLMU / M / SUP 2 /由于脉冲宽度从500 ns增加到100多发性硬化症。随着施加的脉冲宽度增加,切换区域在初始偏振过程中迅速增加。然而,未观察到在晶界处停止扩展的开关区域,并且未观察到晶界的结构域生长。

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