Photochemical efficiency of PS_and membrane lipid peroxidation in leaves of indica and japonica rice (Oryza sativa L.) under different temperatures and light intensities

摘要

Exposure of plant leaves to excessive light can result in reduction in quantum yield. This is known as PI. Long-term exposure of plant to strong light with stress such as chilling emperature can result in photo-destruction of photosynthetic pigments. This destruction is defined as PO. The primary site of PI had been suggested to be located in PS_ reaction center. The states and the re-synthesized capacity of D1 protein were the physiological basis in the course of PS_ recovery. Numerous studies showed that there were multiplex protective echanisms, such as xanthophyll cycle, active oxygen scavenging system, photorespiration, against photodamage in photosynthetic apparatus. In recent years, many studies on PI or PO in plants were carried out and gave varied results, for the photoinhibitory conditions were different. The aims of this contribution are to explore the differences in traits related to PI and PO between indica and japonica rice, the physiological relationships between PI and PO under different temperatures and PFDs. So as to provide physiological basis for the genetic improvement approach to hybrid rice with PI- or PO-tolerance.