Fabrication of micromachined infrared thermopile detector using novel front etch process

摘要

Instead of back etch, front-undercut and a process of their combination, novel front etch process was developed to remove bulk silicon and left a thin membrane as the supporting structure in a thermopile detector. Compared with other means of bulk micromachining process, front etch process posses many merits shown in aspects of photolithography, reliability ad dehydration operation. Using the technology, an infrared thermopile detector was also fabricated.