The efficiency of a new, fast, non-contact photo-thermal cleaning of volatile contamination adsorbed onto silicon wafers is evaluated and a comparison with other conventional cleanings for organics is given. It is shown that the Rapid Optical Surface Treatment (ROST~(TM)) is very effective in organic cleaning without detrimental effects on the treated wafer. ROST is a general final conditioning for metrologies and IC manufacturing steps that are sensitive to hydrocarbon contamination, such as thin film thickness measurement and poly-gate deposition.
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