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Defect Formation During Zinc Diffusion in GaP

机译:间隙锌扩散过程中的缺陷形成

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The defect structure of undoped GaP single crystals following Zn ampoule diffusion between 800°C and 1100°C with metallic Zn and P as sources was observed by transmission electron microscopy for various diffusion conditions. Agglomerates of predominantly perfect interstitial-type dislocation loops, dislocations and small Ga precipitates were observed in the Zn-diffused region. In addition, depending on the diffusion conditions, dislocation networks, Zn-rich precipitates and extrinsic stacking faults were formed. The observations were correlated with Zn concentration profiles obtained from secondary-ion mass spectrometry. The formation, arrangement and temporal evolution of the diffusion-induced defects for P-rich and P-poor diffusion conditions will be discussed and compared with earlier results obtained for Zn diffusion into GaAs and InP.
机译:通过透射电子显微镜观察到Zn安瓿扩散后800℃和1100℃之间的未掺杂间隙单晶的缺陷结构通过透射电子显微镜观察到各种扩散条件。在Zn扩散区域中观察到主要完美的间质型脱位环,脱臼和小GA沉淀的聚集体。另外,取决于扩散条件,形成位错,富含抗沉淀物和外部堆叠故障。观察结果与由二次离子质谱法获得的Zn浓度分布相关。将讨论富含P-和P​​差的扩散条件的扩散诱导的缺陷的形成,布置和时间演化,并与用于Zn扩散到GaAs和InP的前面结果进行比较。

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