Prototyped XY stages driving EB mastering for a high density optical recording

摘要

Prototyped XY-stages driving electron beam (EB) writing system is developed to research the possibility to write fine patterns. High density optical recording pattern with 25Gbit/in{sup}2 is demonstrated. It is also clear that EB writing (drawing) system has a potential to achieve a required fine pattern for 100Gbit/in{sup}2.