首页> 外文会议>Pacific Rim Conference on Lasers and Electro-Optics >Low threshold current density operation (J{sub}(th) = 340A/cm{sup}2) of GaInNAs/GaAs quantum well lasers grown by metalorganic chemical vapor deposition
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Low threshold current density operation (J{sub}(th) = 340A/cm{sup}2) of GaInNAs/GaAs quantum well lasers grown by metalorganic chemical vapor deposition

机译:通过金属有机化学气相沉积生长的GainNAS / GaAs量子孔激光器的低阈值电流密度操作(J {Sub}(Th)= 340a / cm {sup} 2)

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We have achieved the lowest threshold current density of 340 A/cm{sup}2 in 1.25 μm GaInNAs/GaAs lasers grown by metalorganic chemical vapor deposition. A threshold current density per well of 170 A/cm{sup}2 is the record low value for 1.2~1.3 μm GaInNAs lasers.
机译:我们已经实现了由金属有机化学气相沉积的1.25μm的GainNAS / GaAs激光器中的340a / cm {sup} 2的最低阈值电流密度。每个阱的阈值电流密度为170a / cm {sup} 2是1.2〜1.3μm的记录低值,获得1.2〜1.3μm的增益激光器。

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