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Influences of pad shape and solder microstructure on shear force of low cost flip chip bumps

机译:垫形状和焊料微观结构对低成本倒装芯片凸块剪切力的影响

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The bumping process plays a critical role in flip chip technology. A low cost bumping process has been developed using electroless nickel and immersion gold followed by stencil printing. The process flow is described in this paper. The Al pad size is about 100 /spl mu/m in diameter with a pitch of 400 /spl mu/m. Different electroless plating solutions were evaluated and different solder pastes were used to evaluate the stencil printing process. Different pad shapes were also tested for shear strength. Ni studs with no bump material were fabricated to evaluate the electroless process. The shear force test result shows a strength value of 230 MPa for Ni studs. The solder bump after reflow has a diameter of 160 /spl mu/m and a height of 120 /spl mu/m. There is some difference in the shear force test results for different pad shapes. SEM and EDAX results of the fracture surface indicate that the fracture was cohesive or inside the solder. Cross sections showed some intermetallic layers at the interface. A Ni-Sn intermetallic layer and a phosphorus rich layer formed during reflow, which have compositions of Ni/sub 3/Sn/sub 4/ and Ni/sub 3/P respectively. The low cost flip chip samples were subjected to multiple reflows and shear force tests were performed. Fracture surfaces were analysed and failure modes were differentiated.
机译:碰撞过程在倒装芯片技术中起着关键作用。采用化学镀镍和浸渍金,然后是模版印刷的低成本凸块工艺。本文描述了处理流程。 Al焊盘尺寸约为100 / SPL MU / M的直径,间距为400 / SPL MU / m。评估不同的化学镀液溶液,并使用不同的焊膏来评估模版印刷过程。还测试了不同的焊盘形状以进行剪切强度。没有制造没有凸块材料的Ni螺柱以评估化学镜头。剪切力试验结果显示Ni螺柱230MPa的强度值。回流后的焊料凸块的直径为160 / SPL mu / m,高度为120 / spl mu / m。不同垫形状的剪切力测试结果存在一些差异。裂缝表面的SEM和edax结果表明骨折是粘性或焊料内部。横截面显示在界面处的一些金属间层。在回流期间形成的Ni-Sn金属间层和富含磷层,其分别具有Ni / sub 3 / Sn / sub 4 /和Ni / sub 3 / p的组成。低成本倒装芯片样品进行多次回流,进行剪切力测试。分析骨折表面,并且差异不均匀。

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