Investigation of Reactively Sputtered Titania Thin Films Prepared by DC, Pulsed and Highly Ionized Pulsed Power Magnetron Sputtering

摘要

Alumina and titania are important thin films materials in various applications. These applications include: Wear and abrasion resistant coatings for tools, electric insulation, photocatalytic and optical applications like multilayer optical filters. Of general importance are properties like density, micro hardness, wear resistance, refractive and absorption index and electrical insulation. Depending on application, one of these properties has to be optimized. From economic point of view, general process properties like high deposition rate as well as a clean environment have to be fulfilled. The latter is also important for electrical and optical applications where defect free films are required. In the present paper titania thin films were deposited by high power pulse magnetron sputtering methods. Properties of the films were characterized and compared with each other. For fixed pulse pause ratio at varying frequency the ratio of anastase and rutile phase in the prepared samples changed with the frequency. The investigated properties are deposition rate, crystal structure, density, refractive index and the applied peak power.