HIGH ASPECT RATIO NANO-SCALE CF{sub}X STRUCTURES FABRICATED BY DEEP-RIE

摘要

High aspect ratio (>500) nano-scale CF{sub}x (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CF{sub}x nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CF{sub}x was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.