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VACANCY-NITROGEN COMPLEXES IN FLOAT-ZONE SILICON

机译:浮子区硅中空位 - 氮气复合物

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The influence of nitrogen on vacancy reactions during float-zone (FZ) crystal growth and during subsequent inert diffusion steps in the range from 650 to 1000°C was investigated. Using platinum diffusion for characterization, much higher concentrations of vacancies were found in nitrogen-doped crystals than in crystals not intentionally doped with nitrogen. A likely reason is that nitrogen forms complexes with vacancies which immobilize them but which can be broken up and decorated by platinum intersti-tials. During inert anneals the vacancy-nitrogen complexes were found to transform into defects which are not as easily decorated by platinum atoms. This result was also confirmed by experiments in which the temperature of the platinum-diffusion process was varied from 680 to 800°C.
机译:研究了氮对浮区(FZ)晶体生长期间空位反应的影响,以及在650至1000℃的随后的惰性扩散步骤期间。使用铂扩散以表征,在氮气掺杂的晶体中发现了更高浓度的空位,而不是无意掺杂氮的晶体中。可能的原因是氮形式的复合物,空缺的空缺,其固定它们,但可以被铂金术 - 铂金的破碎和装饰。在惰性期间,发现空位 - 氮气复合物被发现转化为不像铂原子容易地装饰的缺陷。通过实验还通过实验证实了该结果,其中铂扩散过程的温度从680变化至800℃。

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