New photoresists from carbazol-containing photopolymers

摘要

With the purpose of expansion of polymer materials in the area of fotonics and image registration we prepared, tested and investigated photopolymer photoresist layers from carbazolylalcylmethacrylats (CEM) with oktylmethacrylats (OMA) copolymers, having the high photosensitivity, adhesive and film forming properties. The photopolymer layers were made by pouring from solutions. The contents of iodophorm and other electron-acceptor additives was maintained within the limits of 5-10 weight