Implementation of Inverse Design Methodology and Volumetric Controlled Manufacturing Methods for Device Integration

摘要

Photolithography is use extensively in the manufacturing of semiconductor devices. Photoresists have been used in the printing-industry to make pre-coated lithographic printing-plates for more than a century. The semiconductor-industry adopted this technique for wafer fabrication in the early 1950s. By mid 1990s, semiconductor-industry was consuming more than 3000-tons of photoresist per year. Moore's law describes an important trend in the history of computer hardware - the number of transistors can be inexpensively placed on an integrated circuit is increasing exponentially and can be doubled approximately every two years. This observation was first made by Intel co-founder Gordon E. Moore in a 1965 paper. This trend has continued for more than half a century and is not expected to stop for another decade at least and perhaps much longer. The density of transistors in a chip is increasing at an exponential rate. In 1965, Moore examined that as the transistors were made smaller through advances in Photolithography, the number would increase at "a rate of roughly a factor of two per year". Today semiconductor industry is moving towards 22nm technology. Some of the new directions in research that may allow Moore's law to continue are as follows. 1) Use of materials other than Silicon. 2) Super cooled transistors using Silicon/Germanium helium super cooled process. 3) "Memristor": a forth basic passive circuit element designed by HP labs whose existence had previously only been theorized.