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Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership

机译：通过所有权成本评估的氮化物PECVD系统等离子体清洁循环的分析优化

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《IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop》|2001年||共3页
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作者
Langan J.; Sui Yuan Lynn; Institute of Electric and Electronic Engineer;
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中图分类自动化技术、计算机技术;
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1. Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O-2/Ar chemistry [J] . Oh CH., Lee NE., Kim JH., Surface & Coatings Technology . 2003,第1a3期

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4. Analytical optimization of the Plasma Clean Cycle for a Nitride PECVD System as evaluated by Cost of Ownership [C] . Langan, J., Sui Yuan Lynn . 2001

机译：通过拥有成本评估的氮化物PECVD系统的等离子体清洁循环的分析优化
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