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PROPERTIES OF THIN CN_x FILMS SYNTHESISED BY ELECTRON BEAM PROCESSING

机译:电子束处理合成的薄CN_x薄膜的性质

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Thin CN_x films have been synthesised by electron beam evaporation of graphite in a nitrogen atmosphere, for various N_2 pressures and different substrate temperatures. The XPS analyses show that the C1s XPS core level, centered above 286 eV, is about 67% of the entire area of the peak. This peak, together with the N1s peak at 400 eV, is a feature of C-N bonds with sp~2 hybridisation. The peak at 287.4 eV, of about 27% of the area, is considered to be due to sp~3 coordinated C=N bonds. The N1s XPS peak at 399 eV is also attributed to C=N bonds with sp~3 hybridisation. The carbon to nitride (C/N) ratio is about 1.165. The XPS results were confirmed by the presence of an FTIR spectra band centered at 2150 cm~(-1).
机译:通过氮气象中的金石墨蒸发已经合成了薄的CN_X薄膜,用于各种N_2压力和不同的基板温度。 XPS分析表明,C1S XPS核心水平以高于286eV为中心,占峰的整个区域的67%。该峰值与400eV的N1S峰值一起是C-N键的特征,具有SP〜2杂交。 287.4eV的峰值,约占该区域的约27%,被认为是由于SP〜3配位C = N键。 399eV的N1S XPS峰也归因于具有SP〜3杂交的C = N键。碳对氮化物(C / N)的比例为约1.165。通过在2150cm〜(-1)的FTIR光谱带存在下,确认XPS结果。

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