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Nucleation and initial stages of growth of copper electrodeposited on anodized 304 stainless steel

机译:铜电涂覆在阳极化304不锈钢上的成核和初始阶段

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Stainless steel is increasingly used as a cathode starting sheet. It was shown earlier that even when depositing copper on copper, a substrate-influenced zone appears in the deposit structure, followed by a transition zone and finally by the electrolysis-influenced structure. On copper, the substrate-influenced zone has a thickness of twenty micrometers and on tinanium, eventually more than fifty micrometers. Initial nucleation and growth have a considerable influence. In this paper, copper was deposited in a channel cell on four different 304 stainless steel substrates: mechanically polished and anodized, respectively, at 0, +400 and +800 mV/SHE in 1 M H_2SO_4 at 20 deg C. Copper was deposited under electrowinning conditions after solvent extraction (SX) 40 g/l Cu~(++), 180 g/l H_2SO_4, 20 or 60 deg C). The results showed that, although Auger surface analyses of the substrates were only slightly different one from another including the oxide thickness, nucleation and initial stages of growth were very sensitive to the surface treatment of the substrate. Potential step and current step methods gave similar results : progressive nucleation followed by 3D diffusion controlled growth. The highest nucleation frequency was observed on stainless steel anodized at 0 mV/SHE, under various electrolysis conditions. The potential influence of these findings on industrial practice is discussed.
机译:不锈钢越来越多地用作阴极起始片。如前所述,即使在铜上沉积铜时,底物影响的区域也出现在沉积物结构中,然后是过渡区,最后通过电解影响的结构。在铜上,基质影响的区域的厚度为20微米和锡鎓,最终超过50微米。初始成核和生长具有相当大的影响力。在本文中,在四个不同的304不锈钢基材上沉积在通道电池中:在20℃下,在0,+ 400和+ 800mV / Shi,在20℃下沉积在0,+ 400和+ 800mV / Shi,沉积铜,沉积在0,+ 400和+ 800mV / Shi。溶剂萃取后的电绕组条件(Sx)40g / L Cu〜(++),180g / L H_2SO_4,20或60℃)。结果表明,尽管底物的螺旋钻表面分析仅略微不同,但在包括氧化物厚度,成核和生长的初始阶段对基材的表面处理非常敏感。电位步骤和电流步骤方法具有类似的结果:进行逐步成核,然后进行3D扩散控制的生长。在各种电解条件下,在0 mV / Shiz阳极氧化的不锈钢上观察到最高成核频率。讨论了这些调查结果对工业实践的潜在影响。

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