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Spectroscopic studies of the electronic structure of wurtzite GaN and Al_xGa_(1-x)N

机译:紫立岩GaN的电子结构的光谱研究和AL_XGA_(1-x)n

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The electronic structure of wurtzite GaN and Al_xGa_(1-x)N has been investigated using photoemission, soft x-ray emission, inverse photoemission, and soft x-ray absorption. A well-defined surface state below the valence band maximum has been measured using angle resolved photoemission for GaN(0001). This state is destroyed by the adorption of either H_2 or O_2. The state shows no dispersion, and has even symmetry with respect to the mirror planes of the surface. Plarization measurements indicate that it is of sp_z character, consistent with a dangling bodn state. Inverse photoemission indicates that there are no unoccupied surface states. The builk density of states of Al_xGa_(1-x)N was measured using soft x-ray absorption and emission. The motion of the elementally resolved bulk valence band maximum was measured as a function of Al-concentration, and the value of the bandgap bowing parameter for Al_xGa_(1-x)N measured to be zero.
机译:使用PhotoMission,软X射线发射,逆光曝光和软X射线吸收,研究了Wurtzite GaN和AL_XGA_(1-X)N的电子结构。使用用于GaN(0001)的角度分辨的光曝光来测量价值下方的明确定义的表面状态。这种状态被H_2或O_2的吸附销毁。状态显示没有分散,并且甚至对表面的镜面平面具有对称性。褶皱测量表明它是SP_Z字符,与悬空BODN状态一致。逆光曝光表示没有未占地面状态。使用软X射线吸收和排放来测量Al_xga_(1-x)n的状态的Builk密度。以Al浓度的函数测量基本分辨的批量价带最大值的运动,并且测量为零的AL_XGA_(1-x)n的带隙弯曲参数的值。

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