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Nanometer-scale scratching on the single-crystal silicon surface using an atomic force microscope

机译:使用原子力显微镜在单晶硅表面上划伤纳米尺度

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Nanometer-scale scratching on the polished Si (001) surface has been carried out by using an atomic force microscope with a three-sided pyramidal diamond tip. The minimum normal force which generates a reproducible groove on the Si (001) surface is approximately 50μN. The straight groove with a depth of 2 nm and a width of 100 nm is successfully generated at a normal force of 70μN. Then a fine letter "P" (scale: 1.2×1.2×0.15μm) is successfully written by mechanical scratching.
机译:通过使用具有三边金字塔钻石尖端的原子力显微镜进行抛光的Si(001)表面上的纳米尺度刮擦。在Si(001)表面上产生可再现凹槽的最小正常力约为50μN。深度为2nm和宽度为100nm的直槽成功地以70μn的正常力成功产生。然后通过机械刮擦成功地编写了一封精细字母“P”(比例:1.2×1.2×0.15μm)。

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