EBAC for Isolating Partially-Localized FEOL Electrical Shorts on Test Structures During Sub-14nm Technology Development

摘要

EBAC is a high-resolution, static technique that can be used for isolating electrical shorts, but it begins to fail for large, interconnected, test structures. In such cases, localization can be achieved when combined with optical localization techniques such as OBIRCH. This paper presents two case studies of subtle, FEOL shorts on a sub-14nm technology that required the resolution of EBAC.