Monitoring a Vacuum Tool Using In-situ Particle Monitoring (ISPM)

摘要

The engineer can significantly improve process tool particle performance by using real time data from an ISPM that monitors particles from the process chamber. To interpret the data taken from an ISPM system can be complex and time consuming. However, there are a series of steps that can greatly simplify the process of optimizing a vacuum ISPM. This paper will show the "recipe" for characterizing a vacuum process tool using an ISPM and will include examples on process improvement and excursion monitoring.