首页> 外文会议>IMEKO World Congress >OPTIMIZATION OF REQUIREMENTS FOR METROLOGICAL SUPERVISION PROCESS IN INDUSTRY OR LABORATORY
【24h】

OPTIMIZATION OF REQUIREMENTS FOR METROLOGICAL SUPERVISION PROCESS IN INDUSTRY OR LABORATORY

机译:在工业或实验室中计量监督过程要求的优化

获取原文

摘要

This paper presents comprehensive attitude to measurement process. Detailed model of metrological supervision can be applied in every industrial enterprise that seeks reliable results solving measurements traceability problem. Optimization of measuring instruments characteristics and created model of metrological supervision can ensure efficient use of these devices in technological process or laboratory. This research is the basis for database structure creation.
机译:本文提出了对测量过程的全面态度。每个工业企业都可以应用计量监督的详细模型,这些工业企业寻求可靠的结果解决测量可追溯性问题。测量仪器特性的优化和Metrologic监督创建模型可以确保在技术过程或实验室中有效地使用这些设备。该研究是数据库结构创建的基础。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号