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TRANSPORT OF NEUTRAL RADICALS IN CF4/O2 MICROWAVE DOWNSTREAM PLASMAS

机译:在CF4 / O2微波下游等离子体中运输中性自由基

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Optical and mass spectrometric diagnostics were employed for investigating the transport of neutral radicals in CF4/O2 microwave downstream plasmas. Fluorine atom densities were measured both in the plasma source and in the downstream region, using Ar actinometry; a small if electrode was set in the downstream region to establish local discharges for optical emission spectroscopy. Moreover, the densities of feed gases (CF4 and O2) and products (SiF4 and F2) were measured in the downstream region by mass spectrometry. The transport efficiency of F atoms from the plasma to the downstream region was quite low (=1 %) for a pure CF4 discharge, and increased significantly with increasing percentage of O2 added. Mass spectrometric measurements indicated that a large amount of F atoms are consumed during their transport to the downstream region through erosion of quartz discharge tube walls as well as surface recombination; both densities of SiF4 and F2 in the downstream region were typically -10-30% of the total gas density.
机译:使用光学和质谱诊断用于研究CF4 / O2微波下游等离子体中中性自由基的运输。使用AR散热法在等离子体源和下游区域中测量氟原子密度;在下游区域中设定了一个小的IF电极,以建立用于光发射光谱的局部放电。此外,通过质谱法在下游区域测量进料气体(CF4和O 2)和产物(SIF4和F2)的密度。对于纯CF4放电,从等离子体到下游区域的F原子的运输效率非常低(= 1%),并随着添加的O2的百分比显着增加。质谱测量结果表明,通过石英排放管壁的侵蚀以及表面重组在其运输到下游区域期间消耗大量的F原子;下游区域中的SIF4和F2的两个密度通常为总气体密度的10-30%。

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