首页> 外文会议>International symposium on materials in space environment >OXYGEN AND VUV IRRADIATION OF POLYMERS: ATOMIC FORCE MICROSCOPY (AFM) AND COMPLEMENTARY STUDIES
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OXYGEN AND VUV IRRADIATION OF POLYMERS: ATOMIC FORCE MICROSCOPY (AFM) AND COMPLEMENTARY STUDIES

机译:聚合物的氧气和VUV辐照:原子力显微镜(AFM)和互补研究

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Materials in low earth orbit (LEO) are exposed to the various constituents of the space environment, including atomic oxygen (ATOX) and solar UV radiation. Although the individual interactions of the different irradiations with a variety of materials are relatively understood, the synergistic interactions of several irradiations acting simultaneously are much less so. The present study investigates the effects of oxygen and vacuum UV (VUV) irradiations on polymers commonly used in space applications (Teflon FEP, Tefzel, Tedlar and polyethylene) having different C/F ratio. The VUV source employed was a deuterium lamp with a magnesium fluoride window that provided radiation between 115 and 300 nm. The 50-100 eV oxygen was generated using a Kaufman ion source. Atomic Force Microscopy (AFM) was found to be very powerful in detecting the surface degradation from the very early stages. Very low oxygen or VUV fluxes effects which would have been very difficult to detect using any other surface sensitive technique were observed by AFM. Complementary analytical techniques employed included precise mass loss measurements and XPS (changes in surface composition). Teflon FEP was found to be eroded by both individual oxygen and VUV exposure, while all other polymers were eroded only by oxygen. The synergistic effect of VUV added to oxygen (with respect to the oxygen erosion only) was found negative for PE, null for Tedlar and positive for Tefzal and Teflon. The different mechanisms responsible for the individual and synergistic effects of VUV and oxygen exposure of these polymers were resolved.
机译:低地球轨道(LEO)的材料暴露于空间环境的各种成分,包括原子氧(ATOX)和太阳能UV辐射。尽管不同照射与各种材料的各个相互作用相对理解,但是几种照射同时作用的协同相互作用较小。本研究研究了氧气和真空UV(VUV)照射对具有不同C / F比的空间应用(Teflon FEP,Tefzel,Tedlar和聚乙烯)的聚合物对常用的聚合物的影响。所用的VUV源是具有氟化镁窗的氘灯,其提供115至300nm之间的辐射。使用Kaufman离子源产生50-100eV氧。发现原子力显微镜(AFM)在检测来自早期阶段的表面劣化方面非常强大。通过AFM观察到非常难以使用任何其他表面敏感技术检测的非常低的氧气或VUV助熔效应。使用的互补分析技术包括精确的质量损失测量和XPS(表面组合物的​​变化)。发现Teflon FEP被单独的氧和VUV暴露侵蚀,而所有其他聚合物的均仅通过氧侵蚀。对氧气(仅相对于氧气侵蚀的VUV的协同效应为PE,滴度为刺痛,刺痛于Tefzal和Teflon。解决了对这些聚合物的VUV和氧暴露的个体和协同作用负责的不同机制。

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