首页> 外文会议>Conference on multilayer and grazing incidence X-ray/EUV optics >Reflectance calibrations of AXAF witness mirrors using synchrotron radiation: 2 to 12 keV
【24h】

Reflectance calibrations of AXAF witness mirrors using synchrotron radiation: 2 to 12 keV

机译:使用同步辐射辐射的AXAF证人反射镜的反射率校准:2至12 kev

获取原文
获取外文期刊封面目录资料

摘要

For the past six years, a high-accuracy reflectance calibration system has been under development at the National Synchrotron Light Source at Brookhaven National Laboratory. The system utilizes Los Alamos National Laboratory's Beamlines X8A and X8C. Its purpose is to calibrate the reflection efficiencies of witness coupons associated with the coating of the eight mirror elements composing the High Resolution Mirror Assembly for NASA's Advanced X-ray Astrophysics Facility (AXAF). During the past year, measurements of reflectances of numerous iridium- coated witness flat mirrors have been obtained to a relative statistical precision of 0.4 percent, and an overall repeatability within 0.8 percent in the overlapping energy regions. The coating processes are strikingly repeatable, with reflectances in the 5-10 keV range for off-end witness flats nearly always being within 1 percent of one another, excluding interference fringes. The comparison reflectances between flats obtained from qualification coating runs and production runs of the Wolter Type I mirror elements are in turn nearly equal, indicating that the qualification run witness flats provide a good representation of the flight optics. Results will produce a calibration of AXAF with extremely good energy detail over the 2-12 keV range, which includes details of the M-absorption edge region for Ir. Development of the program to cover 0.05-2 keV continues.
机译:在过去的六年中,Brookhaven国家实验室的国家同步光源正在开发高精度反射态校准系统。该系统利用LOS Alamos National Laboratory的Beamlines X8A和X8C。其目的是校准与八个镜子元件涂层相关的证人优惠券的反射效率,该八个镜子元件组成用于NASA先进的X射线天体物理学设施(AXAF)的高分辨率镜子组件。在过去的一年中,已经获得了许多铱涂层的证人平面镜的反射的测量,以获得0.4%的相对统计精度,并且在重叠的能量区域中的0.8%内的总重复性。涂布方法是可重复的可重复的,在5-10keV范围内的反射率几乎总是在彼此的1%之外,不包括干涉条纹。从符合型涂层运行和生产运行的平面之间的比较反射频率镜子元件差别几乎相等,表明资格运行证人平面提供了飞行光学元件的良好表示。结果将在2-12 keV范围内产生具有极良好的能量细节的AXAF的校准,其包括IR的M吸收边缘区域的细节。持续0.05-2 kev的计划的开发仍在继续。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号