Study of photoresist pregrooved structures

摘要

Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.