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Time-resolved studies of spatially direct and indirect transitions in GaAs/AlGaAs and InGaAs/GaAs quantum wires

机译:GaAs / Algaas和IngaAs / GaAs量子线的空间直接和间接转换的时间解决研究

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Laser holographic lithography and selective chemical etching have been used to create GaAs/AlGaAs and InGaAs/GaAs quantum well wires. Strong differences are observed between the photoluminescence spectra from the GaAs and InGaAs quantum wires, with the former being dominated by spatially indirect transitions, and the latter by direct transitions. Detailed time resolved photoluminescence studies show a red shift in photoluminescence energy with increasing time delay after excitation for the indirect transition in the GaAs wires. This is accompanied by a non-exponential decay time which increases from 10 ns to greater than 150 ns as the delay time is increased (in a manner similar to that observed in nipi doping superlattices). The InGaAs wires show no such behavior, with a decay time constant of 320 ps at 1.8 K, independent of time delay after excitation, both indicative of a spatially direct transition.
机译:激光全息光刻和选择性化学蚀刻已被用于产生GaAs / Algaas和InGaAs / GaAs量子阱线。从GaAs和InGaAs量子线之间的光致发光光谱之间观察到强烈的差异,前者由空间间接转变为主,并且通过直接转换来支配。详细的时间分辨光致发光研究显示了光致发光能量的红色移位,随着在GaAs线中的间接转变的间接转变之后的升高而增加的时间延迟。这伴随着非指数衰减时间,从10 ns增加到大于150ns,因为延迟时间增加(以与Nipi掺杂超晶格中观察到的方式类似)。 InGaAs电线没有显示出这样的行为,在1.8 k的衰减时间常数为1.8 k,与激励后的时间延迟无关,两者都指示空间直接转换。

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