首页> 外文会议>Annual SPIE conference on Integrated circuit metrology, inspection, and process control >Semiconductor thin-film optical constant determination and thin-film thickness measurement equipment correlation
【24h】

Semiconductor thin-film optical constant determination and thin-film thickness measurement equipment correlation

机译:半导体薄膜光学恒定确定和薄膜厚度测量设备相关性

获取原文

摘要

There are several methods for correlating thin film thickness measurement equipment. The most commonly used method is to program in an offset that gets systematically added to or subtracted from the thickness calculation. Measurement errors can occur using this 'fudge factor' method because the relationship between the reference thicknesses and the measured thicknesses is not, in general, a fixed constant or simple function. A better method for correlating thin film thickness measurement equipment is to tune the instruments to the process by refining the internal optical constants.
机译:有几种用于关联薄膜厚度测量设备的方法。最常用的方法是在从厚度计算中系统地添加或减去的偏移中编程。测量误差可以使用此“融合因子”方法发生,因为参考厚度和测量厚度之间的关系通常是固定恒定或简单的功能。用于关联薄膜厚度测量设备的更好方法是通过精炼内部光学常数来调整仪器到过程。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号