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Behavior of contact potential difference between gold wire and copper oxide surface by nonlinear distortion method in the process of destroying film

机译:在破坏薄膜过程中,非线性变形法通过非线性变形方法与氧化铜表面之间的接触电位差异的行为

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Nonlinear distortion voltage between gold wire and copper surface is observed. It is known nonlinear characteristics come from electron tunneling through a thin insulation film and electron flow over a Schottkey barrier. The height of nonlinear distortion voltage is changed by copper surface condition. In our study, we examined in the process of destroying copper surface film by DC contact voltage and current. There is a tendency that characteristic of the 2nd order distortion voltages are changed by copper surface film's condition. The 2nd order distortion voltage produces a V type valley by applied DC voltages. The applied DC voltage to minimize the 2nd order distortion voltage is same to "contact potential difference". Therefore a symmetric point of nonlinear characteristic is usually not lay at the origin of V-I characteristic. The contact potential difference changes by copper surface condition, such as oxide film thickness. It is an interesting method to measure contact potential difference while the surface is destroying. It is almost same the characteristics of oxide thickness 50nm and 100nm, but a characteristic of 150nm and 200nm thickness are different from the formers.
机译:观察金线和铜表面之间的非线性变形电压。已知的非线性特性来自电子隧穿通过薄绝缘膜和电子流在肖特琴屏障上。非线性变形电压的高度通过铜表面状况而改变。在我们的研究中,我们在通过直流接触电压和电流破坏铜表面膜的过程中。存在通过铜表面膜的状态改变2nd阶失真电压的特性的趋势。第二阶失真电压通过施加的直流电压产生V型谷。施加的直流电压最小化2nd阶失真电压与“接触电位差”相同。因此,非线性特性的对称点通常不会呈现V-I特征的起源。通过铜表面状况(例如氧化物膜厚度)改变触点电位差。在表面破坏时测量接触电位差异是一种有趣的方法。氧化物厚度为50nm和100nm的特性几乎是相同的,但是150nm和200nm厚的特性与成型器不同。

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