首页> 外国专利> ELECTROLESS PALLADIUM AND GOLD-PLATED FILM STRUCTURE AND A PRODUCTION METHOD THEREOF, AND AN ASSEMBLY STRUCTURE AND METHOD FOR A PALLADIUM AND GOLD-PLATED FILM COUPLED WITH A COPPER OR COPPER-PALLADIUM WIRE

ELECTROLESS PALLADIUM AND GOLD-PLATED FILM STRUCTURE AND A PRODUCTION METHOD THEREOF, AND AN ASSEMBLY STRUCTURE AND METHOD FOR A PALLADIUM AND GOLD-PLATED FILM COUPLED WITH A COPPER OR COPPER-PALLADIUM WIRE

机译:无电钯金镀膜结构及其生产方法,以及铜或铜钯线耦合的钯金镀膜的组装结构和方法

摘要

PURPOSE: An electroless palladium and gold-plated film structure and a production method thereof, and an assembly structure and method of a palladium and gold-plated film coupled with a copper or copper-palladium wire are provided to reinforce the wire-coupling force between a copper or palladium-copper wire and a bonding pad by employing a palladium and gold plating layers instead of a nickel layer.;CONSTITUTION: An electroless palladium and gold-plated film structure comprises a palladium plating layer(12,14) which is formed on a bonding pad(10) through a substitution process or a substitution and reduction process and a gold plating layer(16) which is formed on the palladium plating layer through a substitution process, a reduction process, or the combination thereof. A method for manufacturing an electroless palladium and gold plated film comprises the steps of: preparing a bonding pad; forming a palladium plating layer on the bonding pad through a substitution process; and forming a gold plating layer on the palladium plating layer through a substitution process, a reduction process, or the combination thereof.;COPYRIGHT KIPO 2012
机译:目的:提供一种化学镀钯金镀膜结构及其生产方法,以及结合铜或铜钯线的钯镀金膜的组装结构和方法,以增强两者之间的线耦合力。通过使用钯和金镀层代替镍层来形成铜或钯-铜线和键合焊盘;组成:化学镀钯和金镀膜结构包括形成的钯镀层(12,14)通过置换过程或置换和还原过程在键合焊盘(10)上形成金,并通过置换过程,还原过程或其组合在钯镀层上形成金镀层(16)。一种化学镀钯金镀膜的方法,包括以下步骤:准备焊盘;通过置换工艺在键合焊盘上形成钯镀层;通过置换工艺,还原工艺或其组合在钯镀层上形成金镀层。; COPYRIGHT KIPO 2012

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