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4H-SiC epitaxial Schottky detectors: deep-level transient spectroscopy (DLTS) and pulse height spectroscopy (PHS) measurements

机译:4H-SIC外延肖特基探测器:深层瞬态光谱(DLT)和脉冲高度光谱(PHS)测量

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Schottky barrier radiation detectors have been fabricated on n-type 4H-SiC epitaxial layers (Eg = 3.27 eV at 300 K) grownon low-resistive n-type 4H-SiC bulk substrates. Current-voltage (I-V) and capacitance-voltage (C-V) measurements werecarried out, and using a thermionic emission model, Schottky barrier height of ~1.42 eV was obtained. Capacitance modedeep level transient spectroscopy (DLTS) revealed the presence of deep levels along with two shallow level defects relatedto titanium impurities (Ti?) and an unidentified deep electron trap located at 1.42 eV below the conduction bandminimum. The concentration of the lifetime killer Z1/2 defect was found to be ~1013 cm-3. A 0.1 μCi 241Am radiation sourcewas used to investigate the detector performance including charge collection efficiency (CCE) by pulse heightspectroscopy (PHS), and an energy resolution of ~ 0.38% full-width half maxima (FWHM) was observed for alphaparticles at ~ 5447 keV. The average diffusion length (Ld) of holes (minority carriers) were calculated to be ~ 13.6 μmusing a drift-diffusion model and MATLAB code. An electronic noise analysis of front-end readout electronics in termsof equivalent noise charge revealed that the white series noise due to the detector capacitance has substantial effect ontheir spectroscopic detection performance.
机译:肖特基障辐射探测器已在N型4H-SIC外延层(例如,在300k)生长的N型4H-SIC外延层上在低电阻N型4H-SiC散装基材上。电流电压(I-V)和电容 - 电压(C-V)测量是进行,并使用热离子发射模型,获得〜1.42eV的肖特基势垒高度。电容模式深度瞬态光谱(DLT)显示了深度水平的存在以及两个浅水平缺陷相关钛杂质(Ti?)和位于导通带下方1.42 eV的未识别的深电子陷阱最低限度。发现寿命杀伤Z1 / 2缺陷的浓度为约1013cm-3。 0.1μCI241AM辐射源用于调查脉冲高度的探测器性能,包括充电收集效率(CCE)光谱学(pHS),和能量分辨率为α的〜0.38%的全宽半最大马克斯(FWHM)粒子在〜5447 kev。孔的平均扩散长度(LD)(少数型载体)计算为〜13.6μm使用漂移扩散模型和MATLAB代码。前端读出电子产品的电子噪声分析等效噪声电荷显示,由于探测器电容引起的白色系列噪声对它们的光谱检测性能。

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