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Optimization of saw-tooth surface planarization for ultra-low blaze angle gratings for ALS-U

机译:用于ALS-U的超低膨胀角度光栅锯齿表面平面优化

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Planarization is important in many areas of nanostructure fabrication. Here we describe a new process for planarization saw-tooth surface of blazed gratings used for the monochromatization of light, but the applications should be much wider. Such gratings consist of relatively wide and very shallow triangular grooves with slanted facets which are machined with nanometer accuracy. The process of making such gratings includes planarization of a relatively coarse saw-tooth surface with micron deep grooves following by a plasma etch which provides reduction of the facet angle and hence groove depth by a factor of 10 -100. To achieve high quality of the final grating the planarization step should provide a flat surface over the grating facets with sub-nanometer level planarity. We investigated planarization of coarse saw-tooth surfaces with a groove width of 10 μm and a facet angle of 4° by a polymer coating spun on the grating. The optimized planarization procedure provides 100% planarization even on these highly structured surfaces.
机译:平坦化在纳米结构制造的许多领域很重要。在这里,我们描述了一种用于闪光光栅的平坦化锯齿表面的新方法,用于光的单色化,但应用应该更宽。这种光栅由相对宽的非常浅的三角形凹槽,其具有倾斜的刻面,其用纳米精度加工。制造这种光栅的方法包括通过等离子体蚀刻的镜头蚀刻的微米深槽的平坦化,该等离子体蚀刻,其可降低刻面角度,并且因此凹槽深度的减少10 -100倍。为了实现高质量的最终光栅,平坦化步骤应在具有子纳米级平面的光栅面上提供平坦的表面。我们调查了粗锯齿表面的平坦化,沟槽宽度为10μm,通过聚合物涂层纺在光栅上旋转4°的刻面角度。即使在这些高度结构的表面上,优化的平坦化程序也提供了100%的平坦化。

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