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The Effect of Al Doping on Structure and Optical Properties of ZnO Thin Films

机译:Al掺杂对ZnO薄膜结构和光学性质的影响

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Aluminum doped zinc oxide thin films were synthesized by the chemical vapor deposition (CVD) on the glass substrate. The optical and structural properties of these films as a function of Al content (0,1,5,10 wt.%) were investigated. The average transmittance of all films is higher than 80% at a wide wavelength of 300-800nm. The bandgap energy, calculated for all samples with different Al dopant concentration, is around 3. 35-3.56eV. X-ray diffraction results reveal that A1/ZnO films have a hexagonal wurtzite structure with (002) preferred orientation. Top and cross-sectional scanning electron microscopy (SEM) micrographs of the prepared ZnO samples exhibit the crystalline growth structures by increasing Al concentration. Doping the ZnO with A$1^{3+}$ influences the volume composition of ZnO:A1 thin films, causes an increase in the surface roughness with an increase in the Al and O content, and a decrease in the average Zn concentration.
机译:通过玻璃基板上的化学气相沉积(CVD)合成铝掺杂的氧化锌薄膜。研究了这些膜的光学和结构性能作为Al含量(0.1,5,10重量%)的函数。所有薄膜的平均透射率在宽波长为300-800nm的范围内高于80%。针对具有不同Al掺杂剂浓度的所有样品计算的带隙能量约为3. 35-3.56EV。 X射线衍射结果表明,A1 / ZnO膜具有六边形紫硝基钛矿结构,具有(002)优选的取向。制备的ZnO样品的顶部和横截面扫描电子显微镜(SEM)显微照片通过增加Al浓度表现出晶体生长结构。用1美元^ {3 +} $掺杂ZnO影响ZnO:A1薄膜的体积组成,导致Al和O含量的增加,并且平均Zn浓度的降低。

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