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Target Surface Temperature Measurements in dc Magnetrons

机译:DC磁控管中的目标表面温度测量

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New simple method for direct measurements of target surface temperature during DC magnetron sputtering is developed. Along with temperature measurements we measured also the emissivity of targets. It is demonstrated that the surface temperature of the targets (Cu, Mo, Nb discs) may substantially (up to $sim 3000mathrm{C})$ exceed the temperature of the volume of the target. The definition of a “target surface temperature” is given. It is supposed that the thickness of the surface layer that appears on a target subjected to the ion bombardment is equal or close to the penetration depth of ions bombarding the target. The physical model explaining the formation of the surface layer is suggested. The main idea of the model is that the Ar ions bombarding the target may effectively transfer their kinetic energy mostly to the ionic subsystem of a metal rather than to its electron subsystem. Due to very low mobility of metal ions within the layer the thermal conductivity of the layer is substantially lower compared to the rest target volume. As a result the temperature of the layer is higher than that of the rest part of the target.
机译:开发了DC磁控溅射期间目标表面温度直接测量的新简单方法。随着温度测量,我们也测量了目标的发射率。结果证明,目标(Cu,Mo,Nb盘)的表面温度可以基本上(最多$ sim 3000 mathrm {c})$超过目标音量的温度。给出“目标表面温度”的定义。假设出现在经受离子轰击的目标上的表面层的厚度是等于或接近轰击目标的离子的渗透深度。提出了说明表面层形成的物理模型。该模型的主要思想是轰击靶的AR离子可以有效地将其动能大多数为金属的离子子系统而不是其电子子系统。由于层内的金属离子的迁移率非常低,与其余靶体积相比,层的导热率基本下降。结果,层的温度高于目标的静止部分的温度。

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