首页> 外国专利> Device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, a ablation surface, and a magnet assembly

Device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, a ablation surface, and a magnet assembly

机译:用于磁控溅射的装置,包括涂覆材料的靶,该涂覆材料的电或磁性能从位于室温之上的阈值温度达到第一值,并且具有烧蚀表面和磁体组件

摘要

The device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, which enables the magnetron sputtering of the coating material, an ablation surface, which is horizontally arranged opposite to a substrate, where the coating material is removed by means of sputtering, a plasma device with electrode assembly for producing a plasma over the ablation surface, and a magnet assembly for producing a plasma limiting magnetic tunnel. The device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, which enables the magnetron sputtering of the coating material, an ablation surface, which is horizontally arranged opposite to a substrate, where the coating material is removed by means of sputtering, a plasma device with electrode assembly for producing a plasma over the ablation surface, a magnet assembly for producing a plasma limiting magnetic tunnel adjacent to the ablation surface, and a heating device (11) for heating the target to a predefined threshold temperature or above. The target is a tubular, rotatable target in the following tube target, whose magnet assembly is arranged in the interior of the tube and the heating device for heating a section of the tube target, which extends itself only a part of the circumference of the tube target. The heating device is arranged such that a section of the tube target is heated in which the tube target lies outside the effective range of the magnet assembly. The heating device is formed through an electrode arrangement, which is arranged for producing a glow discharge that burns between the tube target and an anode of the electrode assembly. The tube target is arranged with spacers on a carrier tube (2), where the tube target and the carrier tube are thermally decoupled to each other. The reflection and/or absorbing surfaces for reflection and/or absorption of the heat radiation outgoing from the target surface are arranged opposite to the target surface, which is not turned to the substrate. The coolable contact surfaces of a cooling element are detachably present layerwisly on the target surface. The means are arranged for detection of temperature-dependent properties of the tube target for determination and/or control of target temperature. An independent claim is included for a process for coating a substrate.
机译:用于磁控溅射的装置包括涂层的靶材,该靶材的电学或磁性能从高于室温的阈值温度达到第一值,该阈值温度使得能够进行涂层的磁控管溅射,并且烧蚀表面水平相对地布置。到基板上,在该基板上通过溅射去除涂层材料,具有用于在烧蚀表面上方产生等离子体的电极组件的等离子体装置以及用于产生等离子体限制磁隧道的磁体组件。用于磁控溅射的装置包括涂层的靶材,该靶材的电学或磁性能从高于室温的阈值温度达到第一值,该阈值温度使得能够进行涂层的磁控管溅射,并且烧蚀表面水平相对地布置。到基板上,在该基板上通过溅射去除涂层材料,具有用于在消融表面上产生等离子体的电极组件的等离子体装置,用于在消融表面附近产生等离子体限制磁隧道的磁体组件以及加热装置(11)用于将目标加热到预定的阈值温度或更高。该靶是在随后的管靶中的管状的,可旋转的靶,其磁体组件布置在管的内部,并且加热装置用于加热管靶的一部分,该加热装置自身仅在管的圆周的一部分上延伸。目标。加热装置布置成使得加热管靶的一部分,其中管靶位于磁体组件的有效范围之外。加热装置通过电极布置形成,该电极布置被布置用于产生辉光放电,该辉光放电在管靶和电极组件的阳极之间燃烧。所述管靶在承载管(2)上布置有间隔件,其中所述管靶和所述承载管彼此热分离。用于反射和/或吸收从目标表面发出的热辐射的反射和/或吸收表面与未转向基板的目标表面相对设置。冷却元件的可冷却接触表面以层状可拆卸地存在于目标表面上。所述装置布置成用于检测管靶的取决于温度的特性,以便确定和/或控制靶温度。包括涂覆基材的方法的独立权利要求。

著录项

  • 公开/公告号DE102009053609A1

    专利类型

  • 公开/公告日2011-05-19

    原文格式PDF

  • 申请/专利权人 VON ARDENNE ANLAGENTECHNIK GMBH;

    申请/专利号DE20091053609

  • 发明设计人 FABER JOERG;

    申请日2009-11-16

  • 分类号C23C14/35;C23C14/14;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:36

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