首页> 外文会议>Design Automation, 1995. DAC '95. 32nd Conference on >Simultaneous Gate and Interconnect Sizing for Circuit-Level Delay Optimization
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Simultaneous Gate and Interconnect Sizing for Circuit-Level Delay Optimization

机译:同时进行栅极和互连尺寸调整,以实现电路级延迟优化

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With delays due to the physical interconnect dominating the overall logic path delays, circuit-level delay optimization must take interconnect effects into account. Instead of sizing only the gates along the critical paths for delay reduction, the trade-off possible by simultaneously sizing gate and interconnect must also be considered. We show that for optimal gate and interconnect sizing, it is imperative that the interaction between the driver and the RC interconnect load be taken into account. We present an iterative sensitivity-based approach to simultaneous gate and interconnect sizing in terms of a gate delay model which captures this interaction. During each iteration, the path delay sensitivities are efficiently calculated and used to size the components along a path.
机译:由于物理互连导致的延迟在总体逻辑路径延迟中占主导地位,因此电路级延迟优化必须考虑互连效应。不仅要沿着关键路径调整栅极尺寸以减少延迟,还必须考虑同时调整栅极和互连尺寸的可能折衷方案。我们表明,为了实现最佳的栅极和互连尺寸,必须考虑驱动器和RC互连负载之间的相互作用。我们提出了一种基于灵敏度迭代的方法,用于同时捕获栅极和互连尺寸的栅极延迟模型,该模型捕获了这种相互作用。在每次迭代期间,将有效地计算路径延迟敏感度,并将其用于确定沿路径的组件的大小。

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