首页> 外文会议>Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the >Ultralow threshold current 780-nm vertical-cavity surface-emitting lasers with oxide current aperture
【24h】

Ultralow threshold current 780-nm vertical-cavity surface-emitting lasers with oxide current aperture

机译:具有氧化物电流孔径的超低阈值电流780 nm垂直腔面发射激光器

获取原文

摘要

Summary form only given. Vertical cavity surface-emitting lasers (VCSELs) operating at 780 nm usually have AlAs-GaAs superlattice active region, but no good performance is reported yet. We demonstrate the new type of 780 nm VCSELs having AlGaAs DBR quantum wells (QWs) as the active medium. Oxide aperture is located just above the active region for efficient current confinement.
机译:仅提供摘要表格。垂直腔表面发射激光器(VCSEL)工作在780 nm处,通常具有AlAs-GaAs超晶格有源区,但尚未有良好的性能报道。我们演示了具有AlGaAs DBR量子阱(QW)作为活性介质的新型780 nm VCSEL。氧化物孔径位于有源区的正上方,以实现有效的电流限制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号