首页> 外文会议>Integrated Reliability Workshop Final Report, 2002. IEEE International >Sub-quarter micron SRAM cells stability in low-voltage operation: a comparative analysis
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Sub-quarter micron SRAM cells stability in low-voltage operation: a comparative analysis

机译:四分之一微米的SRAM单元在低压操作中的稳定性:比较分析

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Comparative analysis of the conventional 6T and recently proposed loadless 4T CMOS SRAM cells is performed. Based on HSPICE simulations for 0.18-μm technology, we compared the stability of the aforementioned cells to temperature and process (VTH, Leff, TOX) variations as well as the cells robustness in low-voltage operation. We found that at VDD = 1.2 V the loadless 4T cell has a 20% higher static noise margin (SNM) and 1.5 times lower sensitivity to the VTH fluctuations than the 6T cell. On the other hand, the 4T cell has a stronger read current degradation at reduced VDD. The analytical model for SNM calculation of the loadless 4T CMOS SRAM cell has been developed.
机译:对传统的6T和最近提出的无负载4T CMOS SRAM单元进行了比较分析。基于针对0.18-μm技术的HSPICE仿真,我们将上述电池的稳定性与温度和过程(V TH ,L eff ,T OX )变化以及低压操作中的电池坚固性。我们发现,在V DD = 1.2 V时,无负载4T电池的静态噪声容限(SNM)高20%,对V TH 波动的灵敏度低1.5倍。 6T电池。另一方面,在降低的V DD 下,4T单元具有更强的读取电流降级。开发了用于无负载4T CMOS SRAM单元的SNM计算的分析模型。

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