首页> 外文会议>Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual >Reliability and failure analysis of MMIC amplifier fabricated onvarious GaAs substrates
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Reliability and failure analysis of MMIC amplifier fabricated onvarious GaAs substrates

机译:MMIC放大器的可靠性和故障分析。各种砷化镓衬底

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The results are presented of stress aging characteristics of anion-implanted GaAs MMIC (monolithic microwave IC) IF amplifierfabricated on four different substrate materials: 3-in. undoped,chromium-doped, indium-doped, and highly polished, undoped GaAs LEC(liquid encapsulated Czochralski) substrates. Three long-term and sixaccelerated aging tests were performed on more than 900 amplifierstotaling 32000 hours. These tests indicate that primary factorsaffecting device lifetime are process variations, GaAs substratematerial, and substrate surface polish. Good reliability is predictedfor amplifiers fabricated on Cr-doped, undoped, and advanced polishedsubstrate. In-doped samples show instability and inadequate reliability.The failure analysis indicates that the primary causes of devicedegradation are GaAs-metal interface electromigration, interdiffusion,and active carrier density compensation
机译:结果表明了钢的应力老化特性。 离子注入GaAs MMIC(单片微波IC)IF放大器 在四种不同的基材上制造:3英寸。未掺杂 铬掺杂,铟掺杂和高度抛光的未掺杂GaAs LEC (液体封装的直拉)衬底。三个长期和六个 在900多个放大器上进行了加速老化测试 总计32000小时。这些测试表明主要因素 影响器件寿命的是工艺变化,GaAs衬底 材料和基材表面抛光。预计良好的可靠性 适用于采用Cr掺杂,未掺杂和高级抛光工艺制造的放大器 基质。掺杂样品显示不稳定和可靠性不足。 故障分析表明设备的主要原因 GaAs-金属界面电迁移,互扩散, 和有源载流子密度补偿

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