首页> 外文会议>Microsystems,Packaging,Assembly Circuits Technology Conference,(IMPACT),2008 3rd International >Permanent Non-Etching Adhesion Promotion System for Solder Mask Applications
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Permanent Non-Etching Adhesion Promotion System for Solder Mask Applications

机译:用于阻焊膜的永久不腐蚀附着力促进系统

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With the constant drive for miniaturization in the IC substrate market, and the increasing performance demands being made on completed assemblies, the use of etch based adhesion promoter systems is coming into question. Unlike the current technology, Atotech's Secure?? HFz process enhances the adhesion between a Copper conductor and a solder mask with no etching to the conductor itself. This unique approach is designed to meet the current and future market requirements typical to ultra fine line IC substrate manufacturing (sub 10/10??m line and spaces can be achieved). This work details the Secure?? HFz process and discusses testing carried out, in which, the adhesion properties are attained for treated surfaces and a range of solder mask materials. The tests show that surfaces treated with this non-etching chemistry exhibit comparable or greater adhesion strength when compared to a traditional etching based system. Long term reliability is also evaluated through HAST (Highly Accelerated Stress Test) where again overall performance is equivalent to, or better than the current etch based process. The summary of this work is that Copper surfaces treated with the Secure?? HFz process offer a technical advantage in ultrafine line and space applications due to their improved adhesion to solder mask materials with no changes, critically reduction, in overall track geometry.
机译:随着IC基板市场对微型化的不断推动,以及对完整组件的性能要求不断提高,基于蚀刻的粘合促进剂系统的使用受到了质疑。与当前技术不同,Atotech的Secure ?? HFz工艺可增强铜导体和阻焊膜之间的附着力,而不会腐蚀导体本身。这种独特的方法旨在满足当前和未来市场对超细线IC基板制造所特有的需求(可以实现10/10英寸以下的生产线和空间)。这项工作详细介绍了Secure ?? HFz工艺并讨论了进行的测试,在该测试中,已处理的表面和一系列阻焊剂材料均具有粘合性能。测试表明,与传统的基于蚀刻的系统相比,用这种非蚀刻化学处理过的表面表现出相当或更高的粘合强度。还可以通过HAST(高度加速应力测试)评估长期可靠性,该技术的总体性能再次达到或优于当前基于蚀刻的工艺。这项工作的总结是用Secure™镀铜处理过的铜表面。 HFz工艺在超细线和空间应用中具有技术优势,因为它们提高了对阻焊膜材料的附着力,而整体轨道几何形状却没有发生任何变化(严重减少)。

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