首页> 外文会议>IEEE Compound Semiconductor Integrated Circuit Symposium >Achieving the Best Thermal Performance for GaN-on-Diamond
【24h】

Achieving the Best Thermal Performance for GaN-on-Diamond

机译:实现金刚石氮化镓的最佳热性能

获取原文

摘要

GaN-based RF transistors offer impressive power densities, although to achieve the maximum potential offered by GaN, thermal management must be improved beyond the current GaN-on-SiC devices. By using diamond, rather than SiC substrates, transistor thermal resistance can be significantly reduced. It is important to experimentally verify thermal resistance, rather than relying solely on simulation expectations, using measurement results to aid further optimization. The novel thermal characterization methodology presented here combines Raman thermography and simulation to determine the substrate thermal conductivity and GaN/substrate thermal resistance in GaN-on-diamond devices. Measured GaN-on-diamond interfacial thermal resistance is similar to reported values for GaN-on-SiC, whereas the diamond substrate thermal conductivity is substantially higher, resulting in a significantly improved thermal resistance with respect to GaN-on-SiC, with great potential for further improvement.
机译:基于GaN的RF晶体管提供了令人印象深刻的功率密度,尽管要实现GaN提供的最大潜力,必须改善热管理,超越目前的GaN-on-SiC器件。通过使用金刚石而不是SiC衬底,可以显着降低晶体管的热阻。重要的是,通过实验来验证热阻,而不是仅仅依靠仿真预期,而要使用测量结果来帮助进一步优化。本文介绍的新颖的热表征方法结合了拉曼热成像和模拟,以确定GaN-on-Diamond器件中的衬底热导率和GaN /衬底热阻。测得的GaN-on-SiC界面热阻与报道的GaN-on-SiC界面相似,而金刚石基板的导热系数明显更高,从而导致SiC-GaN的热阻显着提高,具有很大的潜力进一步改进。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号