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Transparent conducting CuCr_(1-x)Mg_xO_2 films prepared by pulsed laser deposition

机译:通过脉冲激光沉积制备的透明导电CuCr_(1-x)Mg_xO_2膜

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Transparent conducting CuCr_(1-x)Mg_xO_2 thin films were prepared by pulsed laser deposition (PLD) from polycrystalline CuCr_(1-x)Mg_xO_2 targets. The derived CuCr_(1-x)Mg_xO_2 films were highly c-axis oriented deposited at higher substrate temperature. The micro structural, electrical as well as optical properties were studied. It was found that the films were relatively smooth, and behaved as semiconductors. The transmittances of the films in the visible region are about 80% with direct band gaps about 3.15eV. The results suggested that CuCr_(1-x)Mg_xO_2 films could be successfully prepared by PLD, which can broaden the applications of the transparent conducting oxides films.
机译:从多晶CuCr_(1-x)Mg_xO_2靶材通过脉冲激光沉积(PLD)制备透明导电CuCr_(1-x)Mg_xO_2薄膜。衍生的CuCr_(1-x)Mg_xO_2薄膜在较高的衬底温度下高度c轴取向沉积。研究了微观结构,电学和光学性能。发现该膜是相对光滑的,并且表现为半导体。薄膜在可见光区域的透射率约为80%,直接带隙约为3.15eV。结果表明,PLD法可以成功制备CuCr_(1-x)Mg_xO_2薄膜,可以拓宽透明导电氧化物薄膜的应用范围。

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