P-rich, In-rich and stoichiometric undoped InP melts have beensynthesised by phosphorus in-situ injection method. InP crystal ingotshave been grown from these melts by the liquid encapsulated Czochralskimethod (LEC). Samples from these ingots grown from variousstoichiometric melts have been characterized by Hall effect and FourierTransform Infrared (FT-IR) spectroscopy measurements respectively. TheHall effect measurement results indicate that the net carrierconcentration of P-rich undoped InP is higher than that of In-rich andstoichiometric undoped InP materials. FT-IR spectroscopy measurementsreveal that there are intensive absorption peaks which have been due toa hydrogen related indium vacancy complex VInH4.By comparing FT-IR spectra, it is found that P-rich InP material has themost intensive absorption peak of VlnH4, whileIn-rich InP material has the weakest absorption peak
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机译:富P,富In和化学计量未掺杂的InP熔体
磷原位注入法合成。 InP晶锭
通过液体封装的切克劳斯基(Czochralski)从这些熔体中生长而来
方法(LEC)。这些锭的样品来自各种
化学计量熔体的特征在于霍尔效应和傅立叶
分别进行红外光谱(FT-IR)光谱测量。这
霍尔效应测量结果表明净载流子
富含P的无掺杂InP的浓度高于富含In的InP的浓度
化学计量的非掺杂InP材料。 FT-IR光谱测量
揭示有一个强烈的吸收峰是由于
氢相关的铟空位络合物V In sub> H 4 sub>。
通过比较FT-IR光谱,发现富P的InP材料具有
V ln sub> H 4 sub>的最强吸收峰,而
富含InP的材料具有最弱的吸收峰
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