首页> 外文会议>Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International >Capacitance modeling of laterally non-uniform MOS devices
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Capacitance modeling of laterally non-uniform MOS devices

机译:横向非均匀MOS器件的电容建模

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In compact transistor modeling for circuit simulation, the capacitances of conventional MOS devices are commonly determined as the derivatives of terminal charges, which on their turn are obtained from the so-called Ward-Dutton charge partitioning scheme (Ward, 1981). For devices with a laterally non-uniform channel doping profile, however, it is shown in this paper that: 1) no terminal charges exist for the description of capacitances. Instead, 2) a model is presented for the capacitances of such devices, including numerical results for a MOS transistor with a laterally diffused channel doping profile. Finally, 3) a method is given to incorporate such a capacitance model in circuit simulators which are traditionally based on terminal charge models.
机译:在用于电路仿真的紧凑型晶体管建模中,通常将常规MOS器件的电容确定为端电荷的导数,而后者又从所谓的Ward-Dutton电荷分配方案中获得(Ward,1981)。然而,对于具有横向不一致的沟道掺杂分布的器件,本文显示:1)不存在用于描述电容的端电荷。取而代之的是,2)提出了此类器件电容的模型,包括具有横向扩散沟道掺杂分布的MOS晶体管的数值结果。最后,3)给出了一种将这种电容模型合并到传统上基于终端电荷模型的电路仿真器中的方法。

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