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Electrochemical Polishing Applications and EIS of a Novel Choline Chloride-based Ionic Liquid

机译:新型胆碱盐基离子液体的电化学抛光应用和EIS

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Minimal surface roughness is a critical feature for high-fieldsuperconducting radio frequency (SRF) cavities used to engineerparticle accelerators. Current methods for polishing Niobiumcavities typically utilize solutions containing a mixture ofconcentrated sulfuric and hydrofluoric acid. Polishing processessuch as these are effective, yet there are many hazards and costsassociated with the use (and safe disposal) of the concentrated acidsolutions. An alternative method for electrochemical polishing ofthe cavities was explored using a novel ionic liquid solutioncontaining choline chloride. Potentiostatic electrochemicalimpedance spectroscopy (EIS) was used to analyze the ionicpolishing solution. Final surface roughness of the Nb was found tobe comparable to that of the acid-polishing method, as assessed byatomic force microscopy (AFM). This indicates that ionic liquidbasedelectrochemical polishing of Nb is a viable replacement foracid-based methods for preparation of SRF cavities.
机译:最小的表面粗糙度是高场的关键特征 用于设计的超导射频(SRF)腔 粒子加速器。当前抛光铌的方法 腔通常利用含有以下物质的混合物的溶液 浓硫酸和氢氟酸。抛光工艺 这样有效,但存在许多危害和成本 与浓酸的使用(和安全处置)有关 解决方案。电化学抛光抛光的另一种方法 使用新型离子液体溶液探索腔体 含有氯化胆碱。恒电位电化学 阻抗谱(EIS)用于分析离子 抛光液。发现Nb的最终表面粗糙度为 可以与酸抛光法相媲美,如 原子力显微镜(AFM)。这表明基于离子液体的 铌的电化学抛光是可行的替代方法 酸的SRF腔制备方法。

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