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Electrochemical Polishing Applications and EIS of a Novel Choline Chloride-based Ionic Liquid

机译:电化学抛光应用和新型胆碱基离子液体的EIS

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Minimal surface roughness is a critical feature for high-field superconducting radio frequency (SRF) cavities used to engineer particle accelerators. Current methods for polishing Niobium cavities typically utilize solutions containing a mixture of concentrated sulfuric and hydrofluoric acid. Polishing processes such as these are effective, yet there are many hazards and costs associated with the use (and safe disposal) of the concentrated acid solutions. An alternative method for electrochemical polishing of the cavities was explored using a novel ionic liquid solution containing choline chloride. Potentiostatic electrochemical impedance spectroscopy (EIS) was used to analyze the ionic polishing solution. Final surface roughness of the Nb was found to be comparable to that of the acid-polishing method, as assessed by atomic force microscopy (AFM). This indicates that ionic liquid-based electrochemical polishing of Nb is a viable replacement for acid-based methods for preparation of SRF cavities.
机译:最小的表面粗糙度是用于工程师粒子促进剂的高场超导射频(SRF)空腔的关键特征。抛光铌腔的目前方法通常利用含有浓硫和氢氟酸的混合物的溶液。抛光过程如这些是有效的,然而,与浓缩酸溶液的使用(和安全处理)有许多危险和成本。利用含有胆碱氯化胆碱的新型离子液体溶液探索了腔电化学抛光的替代方法。电位电化学阻抗光谱(EIS)用于分析离子抛光溶液。发现Nb的最终表面粗糙度与酸抛光方法的最终表面粗糙度相当,如原子力显微镜(AFM)评估的那样。这表明Nb的离子液体基电化学抛光是基于酸的方法制备SRF腔的可行替代品。

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